- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; materials therefor; originals therefor; apparatus specially adapted therefor
- G03F 7/021 - Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
Patent holdings for IPC class G03F 7/021
Total number of patents in this class: 32
10-year publication summary
3
|
3
|
2
|
3
|
1
|
3
|
2
|
2
|
3
|
1
|
2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
Owner |
All patents
|
This class
|
---|---|---|
FUJIFILM Corporation | 27102 |
4 |
Boe Technology Group Co., Ltd. | 35384 |
3 |
Rohm and Haas Electronic Materials Korea Ltd. | 546 |
2 |
Wacker Polymer Systems GmbH & Co. KG | 30 |
2 |
Industrial Technology Research Institute | 4898 |
1 |
Eastman Kodak Company | 3444 |
1 |
Samsung SDI Co., Ltd. | 6671 |
1 |
Brewer Science Inc. | 231 |
1 |
DIC Corporation | 3597 |
1 |
Dongjin Semichem Co., Ltd. | 438 |
1 |
Hefei Xinsheng Optoelectronics Technology Co., Ltd. | 2483 |
1 |
Illumina, Inc. | 2771 |
1 |
Institute of Chemistry, Chinese Academy of Sciences | 215 |
1 |
Kiian S.p.A. | 3 |
1 |
Korea Institute of Machinery & Materials | 677 |
1 |
Mercene Labs AB | 11 |
1 |
Mitsubishi Gas Chemical Company, Inc. | 3188 |
1 |
Murakami Co., Ltd. | 9 |
1 |
Promerus, LLC | 172 |
1 |
San-Apro Limited | 73 |
1 |
Other owners | 5 |